Control of RF Match Presets: Common Source of Variation

  • Connie Daigle
  • Published 2008 in 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference

Abstract

While reviewing several scenarios of high reflected power, this paper discusses the importance of maintaining dry etch RF match tune and load recipe presets to minimize variation in critical process outputs and presents a systematic method to efficiently maintain presets using factory automation.

Topics

    6 Figures and Tables

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